Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 195
... methods are shown in Fig . 13 for depositing an element ( usually a metal ) in combi- nation with a gaseous component with which it reacts . Method ( a ) uses an inert gas ion beam to sputter either the metal or compound target , with ...
... methods are shown in Fig . 13 for depositing an element ( usually a metal ) in combi- nation with a gaseous component with which it reacts . Method ( a ) uses an inert gas ion beam to sputter either the metal or compound target , with ...
Page 265
... method ) . There are several ways to calculate thermodynamic equilibrium in multicomponent systems [ 44 ] . We shall briefly discuss the optimization method and the nonlinear equation method . 1. Optimization Method Consider a system in ...
... method ) . There are several ways to calculate thermodynamic equilibrium in multicomponent systems [ 44 ] . We shall briefly discuss the optimization method and the nonlinear equation method . 1. Optimization Method Consider a system in ...
Page 312
... methods : ( 1 ) the hydride method where group V elements are introduced as hydrides , and group III elements as monochlorides , which result from the HCl interaction with the appropriate metals ; ( 2 ) the chloride method where group V ...
... methods : ( 1 ) the hydride method where group V elements are introduced as hydrides , and group III elements as monochlorides , which result from the HCl interaction with the appropriate metals ; ( 2 ) the chloride method where group V ...
Contents
Glow Discharge Sputter Deposition | 13 |
Equipment Configuration | 31 |
Preconditioning of Targets Substrates and Systems for Film | 41 |
Copyright | |
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Å/min alloys anode Appl applications argon atoms bias bombardment cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition flow rate GaAs gases glow discharge polymerization H₂ H₂O heating HNO3 increase ion beam deposition ion source ionization layer mA/cm² magnetic field magnetron mask metal mTorr N₂ nitride O₂ operation oxide photoresist Phys planar plasma plasma etching plating PM sputtering polishing polymer polymer deposition potential pressure Proc produce ratio reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon silicon nitride SiO2 solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York µm/min