Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 57
... positive bias to an independent electrode ( e.g. a substrate ) leads to an increase in the plasma potential to more positive values [ 454 , 456 ] as shown in Fig . 18. Even for very high positive values of V , the effective substrate ...
... positive bias to an independent electrode ( e.g. a substrate ) leads to an increase in the plasma potential to more positive values [ 454 , 456 ] as shown in Fig . 18. Even for very high positive values of V , the effective substrate ...
Page 84
... positive space charge sheath and float at a negative potential relative to the plasma . Substrates sur- rounding a cylindrical - post magnetron may assume a positive potential of 1 or 2 V , probably because of the relatively low ...
... positive space charge sheath and float at a negative potential relative to the plasma . Substrates sur- rounding a cylindrical - post magnetron may assume a positive potential of 1 or 2 V , probably because of the relatively low ...
Page 122
... positive potential on the anode causes the magne- tron to act as a source of positive ions as well as neutrals . The use of an auxiliary bias magnet beneath the stationary substrate is shown in Fig . 9 for three cases : an opposing ...
... positive potential on the anode causes the magne- tron to act as a source of positive ions as well as neutrals . The use of an auxiliary bias magnet beneath the stationary substrate is shown in Fig . 9 for three cases : an opposing ...
Contents
Glow Discharge Sputter Deposition | 13 |
Equipment Configuration | 31 |
Preconditioning of Targets Substrates and Systems for Film | 41 |
Copyright | |
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Å/min alloys anode Appl applications argon atoms bias bombardment cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition flow rate GaAs gases glow discharge polymerization H₂ H₂O heating HNO3 increase ion beam deposition ion source ionization layer mA/cm² magnetic field magnetron mask metal mTorr N₂ nitride O₂ operation oxide photoresist Phys planar plasma plasma etching plating PM sputtering polishing polymer polymer deposition potential pressure Proc produce ratio reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon silicon nitride SiO2 solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York µm/min