Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 24
... produce more electrons that , in turn produce more ions . When the number of electrons generated is just sufficient to produce enough ions to regenerate the same number of elec- trons , the discharge is self - sustaining . The gas ...
... produce more electrons that , in turn produce more ions . When the number of electrons generated is just sufficient to produce enough ions to regenerate the same number of elec- trons , the discharge is self - sustaining . The gas ...
Page 44
... produce ex- ceptionally clean substrate surfaces , even at relatively high gas pressures and low rf voltages [ 220 ] . For example , various refractory alloys have been cleaned successfully in Ar - HCl mixtures , but cleaning in Ar ...
... produce ex- ceptionally clean substrate surfaces , even at relatively high gas pressures and low rf voltages [ 220 ] . For example , various refractory alloys have been cleaned successfully in Ar - HCl mixtures , but cleaning in Ar ...
Page 253
... produce hard coatings , competing with low - temperature H2SO , processes . Sulfonated organic acids , combined with H2SO4 , produce so - called " ' integrally colored " coatings on specific alloys . Various shades are used in ...
... produce hard coatings , competing with low - temperature H2SO , processes . Sulfonated organic acids , combined with H2SO4 , produce so - called " ' integrally colored " coatings on specific alloys . Various shades are used in ...
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Å/min alloys anode Appl argon atoms cathode chemical coatings compounds current density cylindrical-post magnetron deposition rate effect elec electric Electrochem electroless electrolytic electroplating energy Epitaxial erosion etch rate etchants etching field lines film deposition flow gas pressure gases glow discharge glow discharge polymerization H₂ H₂O heating increase ion beam deposition ion bombardment ion source ionization J. A. Thornton layer mA/cm² magnetic field magnetron magnetron sputtering material metal mTorr N₂ negative neutral nitride O₂ operation oxide Phys planar magnetron plasma plating PM sputtering polymer potential power density power supply Proc reaction reactive gas reactive sputtering reactor region secondary electrons Section semiconductor shown in Fig silicon SiO2 solution sputter deposition Sputter Gun sputter yield sputtering gas stoichiometry substrate target surface Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage York