Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 61
... properties , magnetic properties , adhesion , and surface mor- phology , to name but a few . In addition , variations in grain size , preferred orientation , and crystal polymorphs have been observed in some ma- terials . Ohmic contacts ...
... properties , magnetic properties , adhesion , and surface mor- phology , to name but a few . In addition , variations in grain size , preferred orientation , and crystal polymorphs have been observed in some ma- terials . Ohmic contacts ...
Page 248
... properties , better corrosion resistance , magnetic properties , heat treatability , and the ability to substitute for more expensive metals . In some cases their prop- erties are unique . Electroplating thus differs from thermal ...
... properties , better corrosion resistance , magnetic properties , heat treatability , and the ability to substitute for more expensive metals . In some cases their prop- erties are unique . Electroplating thus differs from thermal ...
Page 337
... properties and measurements of the film materials difficult , if not impossible . With the exception of production type reactors now be- coming widely used , plasma reactors in which thin films have been pro- duced are small laboratory ...
... properties and measurements of the film materials difficult , if not impossible . With the exception of production type reactors now be- coming widely used , plasma reactors in which thin films have been pro- duced are small laboratory ...
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Å/min alloys anode Appl argon atoms cathode chemical coatings compounds current density cylindrical-post magnetron deposition rate effect elec electric Electrochem electroless electrolytic electroplating energy Epitaxial erosion etch rate etchants etching field lines film deposition flow gas pressure gases glow discharge glow discharge polymerization H₂ H₂O heating increase ion beam deposition ion bombardment ion source ionization J. A. Thornton layer mA/cm² magnetic field magnetron magnetron sputtering material metal mTorr N₂ negative neutral nitride O₂ operation oxide Phys planar magnetron plasma plating PM sputtering polymer potential power density power supply Proc reaction reactive gas reactive sputtering reactor region secondary electrons Section semiconductor shown in Fig silicon SiO2 solution sputter deposition Sputter Gun sputter yield sputtering gas stoichiometry substrate target surface Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage York