Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 24
... produce more electrons that , in turn produce more ions . When the number of electrons generated is just sufficient to produce enough ions to regenerate the same number of elec- trons , the discharge is self - sustaining . The gas ...
... produce more electrons that , in turn produce more ions . When the number of electrons generated is just sufficient to produce enough ions to regenerate the same number of elec- trons , the discharge is self - sustaining . The gas ...
Page 44
... produce ex- ceptionally clean substrate surfaces , even at relatively high gas pressures and low rf voltages [ 220 ] . For example , various refractory alloys have been cleaned successfully in Ar - HCl mixtures , but cleaning in Ar ...
... produce ex- ceptionally clean substrate surfaces , even at relatively high gas pressures and low rf voltages [ 220 ] . For example , various refractory alloys have been cleaned successfully in Ar - HCl mixtures , but cleaning in Ar ...
Page 253
... produce hard coatings , competing with low - temperature H2SO , processes . Sulfonated organic acids , combined with H2SO4 , produce so - called " integrally colored " coatings on specific alloys . Various shades are used in ...
... produce hard coatings , competing with low - temperature H2SO , processes . Sulfonated organic acids , combined with H2SO4 , produce so - called " integrally colored " coatings on specific alloys . Various shades are used in ...
Contents
J J CUOMO 11 IBM Thomas J Watson Research Center Yorktown | 11 |
ix | 75 |
FREDERICK A LOWENHEIM 209 637 West 7th Street Plainfield | 115 |
Copyright | |
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Å/min alloys Amorphous anode Appl argon atoms bias cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition flow rate GaAs gases glow discharge polymerization H₂ H₂O heating HNO3 increase ion beam deposition ion source ionization layer magnetic field magnetron mask metal mTorr N₂ nitride O₂ operation oxide photoresist Phys planar plasma plasma etching plating PM sputtering polishing polymer polymer deposition potential power density pressure Proc produce ratio reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon silicon nitride SiO2 solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York µm/min