Soft X-Rays and Extreme Ultraviolet Radiation: Principles and ApplicationsThis self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science. |
Contents
INTRODUCTION | 1 |
3 | 17 |
References | 21 |
References | 53 |
6 | 80 |
9 | 94 |
3 | 100 |
5 | 107 |
References | 261 |
EXTREME ULTRAVIOLET AND SOFT XRAY LASERS | 267 |
References | 295 |
References | 333 |
Surface Science at Spatial Resolutions Below 100 Nanometers | 379 |
Homework Problems | 394 |
References | 412 |
APPENDIX A UNITS AND PHYSICAL CONSTANTS | 417 |
References | 113 |
3 | 130 |
4 | 141 |
5 | 168 |
References | 186 |
439 | |
MATHEMATICAL AND VECTOR | 441 |
448 | |
APPENDIX F LORENTZ SPACETIME TRANSFORMATIONS | 454 |
Other editions - View all
Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications David Attwood Limited preview - 2007 |
Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications David Attwood No preview available - 2007 |
Common terms and phrases
absorption acceleration amplitude angular aperture axial bending magnet bound electrons Chapter cm²/g Colorplate component diffraction distribution electric field electromagnetic electron beam electron density emission equation Extreme Ultraviolet Extreme Ultraviolet Lithography filter finite focal frame of reference frequency Fresnel zone plate function harmonic illustrated in Figure integral intensity interface ionization ions lasing length Lithography magnetic field Maxwell's equations multilayer coated multilayer mirrors National Laboratory nm wavelength numerical aperture observed obtained optics oscillation particle pattern phase phase velocity Photoelectron photoemission photon energy Phys pinhole plane plasma polarization propagation pulse quantum radiation cone reflection refractive index region relative spectral bandwidth resonant Section short wavelength shown in Figure sin² soft x-ray spatially coherent Synchrotron Radiation target temperature total external reflection transverse undulator radiation vector velocity visible light W/cm² wave wavelength wiggler X-Ray Laser X-Ray Lithography x-ray microscope X-Ray Microscopy