Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

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Cambridge University Press, 2000 - Science - 470 pages
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This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.
 

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Contents

References
21
References
53
References
96
References
119
References
186
References
261
EXTREME ULTRAVIOLET AND SOFT XRAY LASERS
267
References
295
References
388
References
412
APPENDIX A UNITS AND PHYSICAL CONSTANTS
417
References
439
MATHEMATICAL AND VECTOR
441
References
448
APPENDIX F LORENTZ SPACETIME TRANSFORMATIONS
454
Copyright

References
333

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