Soft X-Rays and Extreme Ultraviolet Radiation: Principles and ApplicationsThis detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science. |
Contents
References | 21 |
References | 53 |
References | 96 |
References | 119 |
References | 186 |
References | 261 |
EXTREME ULTRAVIOLET AND SOFT XRAY LASERS | 267 |
References | 295 |
References | 388 |
References | 412 |
APPENDIX A UNITS AND PHYSICAL CONSTANTS | 417 |
439 | |
MATHEMATICAL AND VECTOR | 441 |
448 | |
APPENDIX F LORENTZ SPACETIME TRANSFORMATIONS | 454 |
References | 333 |
Other editions - View all
Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications David Attwood Limited preview - 2000 |
Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications David Attwood No preview available - 2007 |
Common terms and phrases
absorption acceleration Advanced Light Source amplitude angular atomic axial Brewster's angle Chapter diffraction distribution electric field electromagnetic electron beam electron density emission equation Extreme Ultraviolet Extreme Ultraviolet Lithography factor finite focal frame of reference frequency Fresnel zone plate function glancing incidence half angle harmonic illumination illustrated in Figure integral intensity interface ionization ions irradiation lasing length Lett Lithography magnetic field motion multilayer coated multilayer mirrors National Laboratory nm wavelength numerical aperture observed obtained optics oscillation parameter particle pattern peak phase phase velocity photoemission photon energy photon flux Phys pinhole plane polarization population inversion propagation quantum radiation cone reflection refractive index region relative spectral bandwidth scattering Section short wavelength shown in Figure sin2 spatially coherent spectrum surface Synchrotron Radiation target techniques temperature transverse undulator radiation vector velocity visible light wave wavelength width wiggler X-Ray Laser X-Ray Lithography X-Ray Microscopy