Thin Film ProcessesRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Results 1-5 of 87
Page v
... Deposition 4] VI. The Sputtering Gas 46 VII. Deposition with Simultaneous Ion Bombardment of the Substrate and Growing Film 50 VIII. Rate and Uniformity of Deposition 61 1X. Conclusion 62 References 62 II-2 Cylindrical Magnetron ...
... Deposition 4] VI. The Sputtering Gas 46 VII. Deposition with Simultaneous Ion Bombardment of the Substrate and Growing Film 50 VIII. Rate and Uniformity of Deposition 61 1X. Conclusion 62 References 62 II-2 Cylindrical Magnetron ...
Page 12
... Deposition with Simultaneous Ion Bombardment of the Substrate and Growing Film 50 A. Plasma, Floating, and Bias Potentials 50 B. Gas Incorporation and Desorption 53 C. Stoichiometry of Films 60 D. Physical Film Properties 60 VIII. Rate ...
... Deposition with Simultaneous Ion Bombardment of the Substrate and Growing Film 50 A. Plasma, Floating, and Bias Potentials 50 B. Gas Incorporation and Desorption 53 C. Stoichiometry of Films 60 D. Physical Film Properties 60 VIII. Rate ...
Page 15
... rate of sputtering targets; and largely, but not completely, determines the deposition rate of sputtered films. Several compilations of experimental sputtering yield and related data have been published [3, 5, 6, 21, 22]. A11 sputtering ...
... rate of sputtering targets; and largely, but not completely, determines the deposition rate of sputtered films. Several compilations of experimental sputtering yield and related data have been published [3, 5, 6, 21, 22]. A11 sputtering ...
Page 19
... rate at low energies (generally <200 eV) which have been attributed to local heating of the lattice in a radius of ... deposition rate (Section VIII.B). C. Emission of Radiation In this section, we consider the II-l. GLOW DISCHARGE ...
... rate at low energies (generally <200 eV) which have been attributed to local heating of the lattice in a radius of ... deposition rate (Section VIII.B). C. Emission of Radiation In this section, we consider the II-l. GLOW DISCHARGE ...
Page 37
... deposition rates can be monitored by controlling conditions and deposition time. Invacuum monitors (e.g., quartz microbalance) simply do not work because resputtering processes are different on the head than on substrates. Also, they ...
... deposition rates can be monitored by controlling conditions and deposition time. Invacuum monitors (e.g., quartz microbalance) simply do not work because resputtering processes are different on the head than on substrates. Also, they ...
Contents
9 | |
Chemical Methods of Film Deposition | 207 |
Physicalchemical Methods of Film Deposition | 333 |
Etching Processes | 399 |
Index | 557 |
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Common terms and phrases
A/min Abstr alloys anode Appl argon atoms cathode Chem chemical Chemical vapor deposition coatings composition compounds configuration current density deposition rate effect efficiency electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition first flow rate flux GaAs gas flow gases glow discharge polymerization heat increase ion beam deposition ion etching ionization Kern layer magnetic field magnetron mask metal mTorr nitride oxide photoresist Phys planar plasma etching plating PM sputtering pm/min polishing polymer polymer deposition potential pressure Proc produce profile ratio RCA Rev reaction reactive reactive sputtering reactor reflected Semiconductors shown in Fig SiH4 silicon silicon nitride SiO2 solution species sputter deposition sputter etching Sputter Gun sputtering yield starting material stoichiometry substrate sufficient susceptor techniques Technol temperature thermal thickness thin film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York