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Low-Dielectric Constant Materials III:

C. Case, T. Kikkawa, P. Kohl, W. W. Lee - Technology & Engineering - 1998 - 300 pages
Continuing improvement of integrated circuits (ICs) critically depends on the use of nonconventional materials. Interconnect delay is already the most severe limiting factor in ...
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Low-Dielectric Constant Materials II:

H. Treichel, A. C. Jones, A. Lagendijk, K. Uram - Technology & Engineering - 1997 - 203 pages
Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is ...
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