Thin Film ProcessesRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Results 6-10 of 93
Page 12
John L. Vossen. B. Presputtering of Targets 42 C. Sputter Etching of Substrates 42 VI. The Sputtering Gas 46 A ... Deposition 6] IX. Conclusion 62 References 62 I. INTRODUCTION Over the past 20 years or so there have been numerous ...
John L. Vossen. B. Presputtering of Targets 42 C. Sputter Etching of Substrates 42 VI. The Sputtering Gas 46 A ... Deposition 6] IX. Conclusion 62 References 62 I. INTRODUCTION Over the past 20 years or so there have been numerous ...
Page 13
... deposition source was a thermal evaporation filament instead of a sputtering target and the substrates were connected to a dc sputtering target [16], but it has sometimes been ... sputtering is more. II-l. GLOW DISCHARGE SPUTTER DEPOSITION ...
... deposition source was a thermal evaporation filament instead of a sputtering target and the substrates were connected to a dc sputtering target [16], but it has sometimes been ... sputtering is more. II-l. GLOW DISCHARGE SPUTTER DEPOSITION ...
Page 14
... sputter deposition, surfaces subject to ion bombardment are usually considered as the source of material from which films are grown. In addition to the neutral (sputtered) material liberated from the bombarded surface which eventually ...
... sputter deposition, surfaces subject to ion bombardment are usually considered as the source of material from which films are grown. In addition to the neutral (sputtered) material liberated from the bombarded surface which eventually ...
Page 15
... deposition rate of sputtered films. Several compilations of experimental sputtering yield and related data have been published [3, 5, 6, 21, 22]. A11 sputtering yields and related data should be used with caution ... SPUTTER DEPOSITION 15.
... deposition rate of sputtered films. Several compilations of experimental sputtering yield and related data have been published [3, 5, 6, 21, 22]. A11 sputtering yields and related data should be used with caution ... SPUTTER DEPOSITION 15.
Page 17
... sputtering, it is highly Table 111 Miscellaneous Sputtering Yields Material Gas Energy (keV) Yield. u-l. GLOW DISCHARGE SPUTTER DEPOSITION 17.
... sputtering, it is highly Table 111 Miscellaneous Sputtering Yields Material Gas Energy (keV) Yield. u-l. GLOW DISCHARGE SPUTTER DEPOSITION 17.
Contents
9 | |
Chemical Methods of Film Deposition | 207 |
Physicalchemical Methods of Film Deposition | 333 |
Etching Processes | 399 |
Index | 557 |
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Common terms and phrases
A/min Abstr alloys anode Appl argon atoms cathode Chem chemical Chemical vapor deposition coatings composition compounds configuration current density deposition rate effect efficiency electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition first flow rate flux GaAs gas flow gases glow discharge polymerization heat increase ion beam deposition ion etching ionization Kern layer magnetic field magnetron mask metal mTorr nitride oxide photoresist Phys planar plasma etching plating PM sputtering pm/min polishing polymer polymer deposition potential pressure Proc produce profile ratio RCA Rev reaction reactive reactive sputtering reactor reflected Semiconductors shown in Fig SiH4 silicon silicon nitride SiO2 solution species sputter deposition sputter etching Sputter Gun sputtering yield starting material stoichiometry substrate sufficient susceptor techniques Technol temperature thermal thickness thin film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York