Front cover image for Thin film processes

Thin film processes

Print Book, English, 1978
Academic Press, New York, 1978
xi, 564 pages : illustrations ; 24 cm
9780127282503, 0127282505
4056878
Machine derived contents note: Table of contents for Thin film processes / edited by John L. Vossen, Werner Kern
Bibliographic record and links to related information available from the Library of Congress catalog
Information from electronic data provided by the publisher. May be incomplete or contain other coding
Introduction.<$> J.L. Vossen, <$> Physical Methods of Film Deposition.<$> J.L. Vossen and J.J. Cuomo, <$> Glow Discharge Sputter Deposition. J.A. Thornton and A.S. Penfold, <$> Cylindrical Magnetron Sputtering. D.B. Fraser, <$> The Sputter and S-Gun Magnetrons. R.K. Waits, <$> Planar Magnetron Sputtering. J.M.E. Harper, <$> Ion Beam Deposition. Chemical Methods of Film Deposition.<$> F.A. Lowenheim, <$> Deposition of Inorganic Films from Solution. W. Kern and V.S. Ban, <$> Chemical Vapor Deposition of Inorganic Thin Films. Physical-Chemical Methods of Film Deposition<$> J.R. Hollahan and R.S. Rosler, <$> Plasma Deposition of Inorganic Thin Films. H. Yasuda, <$> Glow Discharge Polymerization. Etching Processes.<$> W. Kern and C.A. Deckert, <$> Chemical Etching. C.M. Melliar-Smith and C.J. Mogab, <$> Plasma-Assisted Etching Techniques for Pattern Delineation. References. Index
Library of Congress subject headings for this publication: Thin films